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Development of Grazing Incidence Multilayer Mirrors for Hard X-ray Focusing Telescopes

机译:硬X射线聚焦望远镜的掠入射多层反射镜的研制

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摘要

We are developing depth-graded, multilayer-coated mirrors for astrophysical hard X-ray focusing telescopes. In this\udpaper, we discuss the primary technical challenges associated with the multilayer coatings, and report on progress to date. We have sputtered constant cl-spacing and depth-graded W / Si multilayers onto 0.3- 0.5 mm thick DURAN\udglass (AF45 and D263) and 0.4 mm thick epoxy replicated aluminum foils (ERAFs) , both of which are potential\udmirror substrates. We have characterized the interfacial roughness, uniformity, and stress of the coatings. The\udaverage interfacial roughness of each multilayer was measured from specular reflectivity scans (Bi = Br) using Cu\udK0 X-rays. The thin film stress was calculated from the change in curvature induced by the coating on flat glass\udsubstrates. Thickness and roughness uniformity were measured by taking specular reflectivity scans of a multilayer deposited on the inside surface of a quarter cylinder section. We found that interfacial roughness (a) in the multilayers was typically between 3.5 and 4.0 A on DESAG glass, and between 4.5 and 5.0 A on the ERAFs. Also, we found that coatings deposited on glass that has been thermally formed into a cylindrical shape performed as well as flat glass. The film stress, calculated from Stoney's equation, for a 200 layer graded multilayer was approximately 200 MPa. Our uniformity measurements show that with no baffles to alter the deposition profile on a curved optic, the layer thickness differs by "'203 between the center and the edge of the optic. Interfacial roughness, however, remained constant, around 3.6 A, throughout the curved piece, even as the layer spacing dropped off.
机译:我们正在为天体物理硬X射线聚焦望远镜开发深度分级的多层镀膜反射镜。在本文中,我们讨论了与多层涂料相关的主要技术挑战,并报告了迄今为止的进展。我们已经在0.3- 0.5毫米厚的DURAN \ udglass(AF45和D263)和0.4毫米厚的环氧复制铝箔(ERAFs)上溅射了恒定的cl-spacing和深度渐变的W / Si多层膜,这两个都是潜在的\ udmirror基板。我们已经表征了涂层的界面粗糙度,均匀性和应力。每个多层的平均界面粗糙度是使用Cu udK0 X射线从镜面反射率扫描(Bi = Br)测得的。薄膜应力是由平板玻璃\ u基板上的涂层引起的曲率变化计算得出的。通过对沉积在四分之一圆柱部分的内表面上的多层进行镜面反射率扫描来测量厚度和粗糙度均匀性。我们发现,多层膜的界面粗糙度(a)在DESAG玻璃上通常在3.5至4.0 A之间,而在ERAF上在4.5至5.0 A之间。此外,我们发现沉积在玻璃上的涂层与平板玻璃一样,可以热成型为圆柱形。根据Stoney方程计算的200层渐变多层膜的膜应力约为200 MPa。我们的均匀性测量结果表明,在没有折流板来改变弯曲光学元件的沉积轮廓的情况下,光学元件的中心和边缘之间的层厚度相差''203。但是,在整个光学元件中,界面粗糙度保持恒定,约为3.6 A弯曲的片,即使层间距下降。

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